Roller-embossing shims
Characteristics:
Flexible Nickel-shims with a thickness range 0.25 – 0.5mm. They are mainly used on roller-embossing equipment where the highly flexible Ni-shim is mounted on a rotating cylinder. Reel-to-reel embossing of nanopattern (holograms, anti-counterfeiting, micro-optics or security features) are the main applications.
1: Roller-embossing shims, patterned frontside and grinded backside
2: Roller-embossing shims, patterned frontside and grinded backside
3: Roller-embossing shims, patterned frontside and grinded backside
4: Master (brass/NiP) and sub-master (Ni)
5: Roller-embossing shim, patterned frontside
6: Roller-embossing shim, grinded backside
7: Roller-embossing shims, patterned frontside and grinded backside
8: Roller-embossing shims, patterned frontside
9: Roller-embossing shims, patterned frontside and grinded backside
10: Roller-embossing shims, patterned frontside and grinded backside
11: Roller-embossing shims, patterned frontside
12: Inspection of retroreflector-pattern at 200x: protruding pyramids
13: Inspection of retroreflector-pattern at 200x: protruding pyramids
14: Inspection of retroreflector-pattern at 200x: recessed pyramids
15: Inspection of retroreflector-pattern at 200x: recessed pyramids
Material: EF-Nickel
Applications: Nano- and microoptics, microfluidics.
1. Manufacturing a brass/NiP =» master
2. Prepare the master for Ni-electroforming =» sub-master (pattern inverted / mirrored)
3. Prepare sub-master for Ni- electroforming a thin shim =» working copy (pattern same as master)
4. Post-processing shape of the shim for mounting on the rotating cylinder
1. UV-lithography a resist coated substrate =» master
2. Prepare the master for Ni-electroforming =» sub-master (pattern inverted / mirrored)
3. Prepare sub-master for Ni- electroforming a thin shim =» working copy (pattern same as master)
4. Post-processing shape of the shim for mounting on the rotating cylinder.
Specifications:
- Pattern size range ≥ 70nm
- Pattern height/uniformity = 50nm – 50µm / 5%
- EXCLUSIVE: Adjustable drafted sidewalls up to 15° (easy demolding)
- Manufacturing according to adapted LiGA-process
- Multilevel pattern available (micro+nano)
- Alignment-precision: level-to-level ≤ 3μm
- Alignment-precision: micropattern to machined features ≤ 20μm
- Shim thickness: 0.25 – 0.5mm
- Maximal shim dimensions= 300 x 300mm
- Maximal patterned area= 200 x 200mm
- Parallelism Frontside-to-backside ≤ 10μm (Backside: surface grinded)
- Robust handling
- Ready-to-use shims according to customer drawing
- Contour wire-electrodischarge machined (tolerance: ±10µm)
- Available antisticking-coating (fluoro-based)
- Available wear-protection coating (TiN)
- Compatibility to diamond milling
- Compatibility to most patterning methods: - e-beam resists (PMMA, HSQ)
- XIL-resists
- AZ positive resists, Microchem SU-8
- Hot-embossed polymers, Thermal imprinting,...