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High definition microstructured Stencil masks.


Our high-definition micropatterned stencil masks are made using the very versatile UV-LiGA process with photoresist features defining an inverted shape of the final part-geometry. Our stencil masks have tapered sidewalls in order to minimize the shadowing effect during the PVD- or CVD-coating processes.

Material: Nickel, Nickel-Phos12 (580HV)

Applications: Hard mask during high-temperature PVD or CVD-processes


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Case study 1: From customer design to ready-to-use stencil masks
Manufacturing a batch of stencil masks based on customer drawings and pattern designs:

1. Convert customer data into Maskdesign
2. Fabrication of maskset
3. Lithography on substrates =» resist-mold
4. Prepare the resist-master for Ni-electroforming
5. Removal of resist and release from wafer

Website Updated: 07-04-2020 // Copyright © 2020 applied microSWISS GmbH